Mist chemical vapor deposition of α-Ga 2 O 3 and α-Fe 2 O 3 thin films on corundum-structured rh-ITO electrode

Mist chemical vapor deposition of α-Ga₂O₃ and α-Fe₂O₃ thin films on corundum-structured rh-ITO electrode

Oral presentation-02

Presented by: Kazuki Shimazoe

Kazuki Shimazoe et al.

Department of Electronics, Kyoto Institute of Technology